In order to print the smallest structures in silicon, a massive ASML Twinscan machine is needed. Current generation technology can create line widths of 13nm, and those machines cost $150m. The new generation can go down to 8nm, and cost a massive $350m! In this video, we tour Intel's Oregon Fab where they've completed installing the world's first commercial HighNA EUV machine. It's in the calibration phase now, ready for testing.

[00:00] Twinscan NXE:5000
[01:20] NA and EUV
[03:00] Installation Logistics
[04:30] FIRING MAH LAZOR
[07:20] 10nm Line Widths
[09:20] 14A Roadmap... and HyperNA
[12:25] Touring The Fab
[14:15] Dr. Mark Phillips
[15:30] Tin Droplet Suppliers
[17:00] Visiting Other Fabs





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Welcome to the TechTechPotato (c) Dr. Ian Cutress
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